PELCO® 35nm Silicon Nitride Support Films for TEM Rotated the next level in a

the next level in a series of magnification calibration standards (the MRS-1

NIST = National Institute of Standards and Technology

This advanced CD calibration test specimen is suited for calibrating smaller structures

b) High density polyethylene (HDPE

Excellent mechanical strength and toughness

PELCO® 35nm Silicon Nitride Support Films for TEM Rotated the next level in aDESCRIPTION PRODUCT SPECIFICATIONS 35nm membrane thickness 25 apertures 200m frame thickness 21515 10 Silicon Nitride Support Film, 35nm, 70x70m Aperture (25) on 0. 5 x 0. 5mm Window pkg 10 Defining parameters for the PELCO Silicon Nitride Support Films are: Film Thickness: Resilient, ultra low stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;