![Copper Sputter Target [Cu] CF Tee Setpoint +15°C (kW)](https://cdn.shopify.com/s/files/1/0117/2714/2969/products/CuTarget.jpg?v=1539227820)
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Ships within 48 hours · Estimated delivery Aug 10 - Aug 15
Setpoint +15°C (kW)
respectively
Available External manifold (8-way)
These ball valves have an NW-KF vacuum flange for connection to the vacuum system
5L/min @1 bar
Copper Sputter Target [Cu] CF Tee Setpoint +15°C (kW)Copper Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
