Hellmanex III for Critical Cleaning OFET fabrication 668 cd/m2 Max

668 cd/m2 Max

achieving mobilities of up to 4

5% 200 mA 10 Ω/sq ±1% ±0

All of our chucks have a recess which holds the substrate securely in place while allowing excess solution to drain away

N-dimethylamino)-propyl]fluorene MSDS sheet

Hellmanex III for Critical Cleaning OFET fabrication 668 cd/m2 MaxPlease note: due to shipping restrictions there is a maximum order quantity of 200 ml Hellmanex III for Critical Cleaning Essential starting point for fabrication of organic devices Getting substrates clean is the essential starting point for fabrication of organic devices. Hellmanex III has been designed to provide exceptional cleaning of glass and quartz substrates, without damaging them or leaving a residue behind. Typically, we use 2 ml of