Manufactured from polypropylene to resist most solvents and acids used in organic electronics processes including THF
defect-free coatings
Product Code Form Package/Substrates* Price M2161F11 Monolayer Films SiO2/Si - 1 Each [[price gbp="200"]] M2161F11 Monolayer Films SiO2/Si - 2 Each [[price gbp="340"]] M2162F11 Monolayer Films PET - 1 Each [[price gbp="200"]] M2162F11 Monolayer Films PET - 2 Each [[price gbp="340"]] M2319F11 Monolayer Films Sapphire - 1 Each [[price gbp="200"]] M2319F11 Monolayer Films Sapphire - 2 Each [[price gbp="340"]] M2320F11 Monolayer Films Quartz - 1 Each [[price gbp="200"]] M2320F11 Monolayer Films Quartz - 2 Each [[price gbp="340"]] M2163F11 Few-Layer Films SiO2/Si - 1 Each [[price gbp="200"]] M2163F11 Few-Layer Films SiO2/Si - 2 Each [[price gbp="340"]] M2164F11 Few-Layer Films PET - 1 Each [[price gbp="200"]] M2164F11 Few-Layer Films PET - 2 Each [[price gbp="340"]] M2321F11 Few-Layer Films Sapphire - 1 Each [[price gbp="200"]] M2321F11 Few-Layer Films Sapphire - 2 Each [[price gbp="340"]] M2322F11 Few-Layer Films Quartz - 1 Each [[price gbp="200"]] M2322F11 Few-Layer Films Quartz - 2 Each [[price gbp="340"]] *typical representative size
Hellmanex III has been designed to provide exceptional cleaning of glass and quartz substrates
Synthesis and Optical Properties of Large-Area Single-Crystalline 2D Semiconductor WS 2 Monolayer from Chemical Vapor Deposition
FL3N-2BAPE Quantity:1 g Manufactured from polypropylene to resistAmine functionalized fluorine boronic ester A versatile building block for the synthesis of conjugated semiconducting polymer containing fluorine unit, FL3N 2BAPE, 3,3' (2,7 bis(4,4,5,5 tetramethyl 1,3,2 dioxaborolan 2 yl) 9H fluorene 9,9 diyl)bis(N,N dimethylpropan 1 amine), CAS 953390 94 8 Specifications MSDS Literature and Reviews FL3N 2BAPE is a fluorene derivative that bears the functionalities of two N,N dimethylpropan 1 amines and two boronic